Itani, Toshiro: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - The effect of resist material composition on development behavior

Wallow, Thomas I., Hohle, Christoph K., Minegishi, Shinya, Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 849 KB

english, 2015

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - EUV resist simulation based on process parameters of pattern formation reaction

Wood, Obert R., Panning, Eric M., Sugie, Norihiko, Itani, Toshiro, Kozawa, Takahiro

Year:

2014

Language:

english

File:

PDF, 2.03 MB

english, 2014

3

Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 395 KB

english, 2014

4

Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.72 MB

english, 2014

5

Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 679 KB

english, 2015

6

Effects of effective reaction radius for neutralization on performance of chemically amplified resists

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.27 MB

english, 2014

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Study on stochastic phenomena induced in chemically amplified poly(4-hydroxystyrene- co-t -butyl methacrylate) resist (high performance model resist for extreme ultraviolet lithography)

Hohle, Christoph K., Younkin, Todd R., Kozawa, Takahiro, Santillan, Julius J., Itani, Toshiro

Year:

2016

Language:

english

File:

PDF, 410 KB

english, 2016

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Evaluations of negative tone development resist and process for EUV lithography

Wood, Obert R., Panning, Eric M., Takahashi, Toshiya, Fujitani, Noriaki, Itani, Toshiro

Year:

2014

Language:

english

File:

PDF, 1.05 MB

english, 2014

9

Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.04 MB

english, 2014

10

Assessment and Extendibility of Chemically Amplified Resists for Extreme Ultraviolet Lithography: Consideration of Nanolithography beyond 22 nm Half-Pitch

Kozawa, Takahiro, Oizumi, Hiroaki, Itani, Toshiro, Tagawa, Seiichi

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 1.03 MB

english, 2011

11

Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Kozawa, Takahiro, Oizumi, Hiroaki, Itani, Toshiro, Tagawa, Seiichi

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 518 KB

english, 2010

12

In situ Characterization of Photoresist Dissolution

Itani, Toshiro, Santillan, Julius Joseph

Journal:

Applied Physics Express

Year:

2010

Language:

english

File:

PDF, 1.35 MB

english, 2010

13

In situ characterization of nano-scale pattern roughness during resist dissolution process

Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Journal:

Microelectronic Engineering

Year:

2015

Language:

english

File:

PDF, 1.11 MB

english, 2015

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement

Wood, Obert R., Panning, Eric M., Kozawa, Takahiro, Fujii, Shinya, Santillan, Julius J., Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 208 KB

english, 2015

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of resist material and process for hp-2x-nm devices using EUV lithography

Matsunaga, Kentaro, Oizumi, Hiroaki, Kaneyama, Koji, Shiraishi, Gousuke, Matsumaro, Kazuyuki, Santillan, Julius Joseph, Itani, Toshiro, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 6.85 MB

english, 2010

16

In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU

Matsuda, Naohiro, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo, Oizumi, Hiroaki, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 224 KB

english, 2011

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Stochastic effects in fabrication of 11nm line-and-space patterns using extreme ultraviolet lithography

Wood, Obert R., Panning, Eric M., Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Year:

2014

Language:

english

File:

PDF, 217 KB

english, 2014

18

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Wavefront aberration measurement in 157-nm high numerical aperture lens

Kim, Jaehwan, Suganaga, Toshifumi, Watanabe, Kunio, Kanda, Noriyoshi, Itani, Toshiro, Cashmore, Julian S., Gower, Malcolm C., Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 482 KB

english, 2003

19

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Novel main-chain-fluorinated polymers for 157-nm photoresists

Toriumi, Minoru, Koh, Meiten, Ishikawa, Takuji, Kodani, T., Araki, Takayuki, Aoyama, Hirokazu, Yamashita, Tsuneo, Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 201 KB

english, 2003

20

Alternative Developer Solutions and Processes for EUV and ArFi Lithography

Harumoto, Masahiko, Santillan, Julius Joseph, Nakayama, Chisayo, Tanaka, Yuji, Motono, Tomohiro, Asai, Masaya, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2019

File:

PDF, 1.35 MB

2019

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Quantification of the resist dissolution process: an in situ analysis using high speed atomic force microscopy

Hohle, Christoph K., Younkin, Todd R., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Year:

2016

Language:

english

File:

PDF, 2.13 MB

english, 2016

22

Antitumor activity of a polysaccharide fraction extracted from cultured fruiting bodies of Grifola frondosa.

SUZUKI, IWAO, ITANI, TERU, OHNO, NAOHITO, OIKAWA, SHOZO, SATO, KICHIRO, MIYAZAKI, TOSHIO, YADOMAE, TOSHIRO

Journal:

Journal of Pharmacobio-Dynamics

Year:

1984

File:

PDF, 818 KB

1984

23

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Reactivity of model compounds of ArF immersion, ArF, and KrF resists with diphenylsulfinyl radical cation, a cage-escape product of photochemistry of triphenylsulfonium salts

Matsui, Yoshinori, Lin, Qinghuang, Sugawara, Hidekazu, Tsuji, Shou, Itani, Toshiro, Seki, Shu, Kozawa, Takahiro, Tagawa, Seiichi

Year:

2006

Language:

english

File:

PDF, 685 KB

english, 2006

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Recent progress of negative-tone imaging with EUV exposure

Wallow, Thomas I., Hohle, Christoph K., Fujimori, Toru, Tsuchihashi, Toru, Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 432 KB

english, 2015

25

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - A study of EUV resist outgassing characteristics using a novel outgas analysis system

Santillan, Julius Joseph, Lin, Qinghuang, Toriumi, Minoru, Itani, Toshiro

Year:

2007

Language:

english

File:

PDF, 302 KB

english, 2007

26

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography

Watanabe, Kunio, Tanabe, Hiroyoshi, Kurose, Eiji, Suganaga, Toshifumi, Itani, Toshiro

Year:

2003

Language:

english

File:

PDF, 508 KB

english, 2003

27

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Kurose, Eiji, Tanabe, Hiroyoshi, Watanabe, Kunio, Suganaga, Toshifumi, Itani, Toshiro, Fujii, Kiyoshi

Year:

2004

Language:

english

File:

PDF, 485 KB

english, 2004

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Base quencher effects in chemically amplified resist at sub-30-nm fabrication

Henderson, Clifford L., Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Toriumi, Minoru, Itani, Toshiro

Year:

2008

Language:

english

File:

PDF, 176 KB

english, 2008

29

Characterization of Fluoropolymer Resist for 157-nm Lithography

Hagiwara, Takuya, Irie, Shigeo, Itani, Toshiro, Kawaguchi, Yasuhide, Yokokoji, Osamu, Kodama, Shun-ichi

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 1.84 MB

2003

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Analysis of resist patterns for material and process design: parameter extraction from dose pitch matrices of line-width and edge roughness and cross-sectional SEM images

Kozawa, Takahiro, Allen, Robert D., Somervell, Mark H., Oizumi, Hiroaki, Itani, Toshiro, Tagawa, Seiichi

Year:

2011

Language:

english

File:

PDF, 693 KB

english, 2011

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - EUV resist processing with flash-lamp

Santillan, Julius Joseph, Kaneyama, Koji, Morita, Akihiko, Fuse, Kazuhiko, Kiyama, Hiroki, Asai, Masaya, Itani, Toshiro, Somervell, Mark H., Wallow, Thomas I.

Year:

2012

Language:

english

File:

PDF, 1.71 MB

english, 2012

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Alternative resist processes for LWR reduction in EUVL

La Fontaine, Bruno M., Kaneyama, Koji, Matsunaga, Kentaro, Shiraishi, Gousuke, Santillan, Julius Joseph, Itani, Toshiro

Year:

2010

Language:

english

File:

PDF, 1.23 MB

english, 2010

33

Resist Materials and Processes for Extreme Ultraviolet Lithography

Itani, Toshiro, Kozawa, Takahiro

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 1.62 MB

english, 2013

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Novel ultra-high sensitive 'metal resist' for EUV lithography

Panning, Eric M., Goldberg, Kenneth A., Fujimori, Toru, Tsuchihashi, Toru, Minegishi, Shinya, Kamizono, Takashi, Itani, Toshiro

Year:

2016

Language:

english

File:

PDF, 656 KB

english, 2016

35

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

Yamashita, T., Sturtevant, John L., Ishikawa, T., Yoshida, T., Hayamai, T., Araki, Takayuki, Aoyama, H., Hagiwara, T., Itani, Toshiro, Fujii, Kiyoshi

Year:

2005

Language:

english

File:

PDF, 217 KB

english, 2005

36

Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 376 KB

english, 2008

37

157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers

Irie, Shigeo, Ishikawa, Seiichi, Hagiwara, Takuya, Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Kawaguchi, Yasuhide, Kodama, Syun-ichi, Yokokoji, Osamu, Kaneko, Isamu, Takebe, Yoko, Okada, Sh

Journal:

Japanese Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 400 KB

english, 2003

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - The effect of resist dissolution process on pattern formation variability: an in situ analysis using high-speed atomic force microscopy

Wallow, Thomas I., Hohle, Christoph K., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 1.79 MB

english, 2015

39

Fluorinated-Polymer Based High Sensitivity Extreme Ultraviolet Resists

Santillan, Julius Joseph, Yamashita, Tsuneo, Morita, Masamichi, Tanaka, Yoshito, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 291 KB

english, 2010

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Evaluations of EUV resist outgassing by gas chromatography mass spectrometry (GC-MS)

La Fontaine, Bruno M., Oizumi, Hiroaki, Matsumaro, Kazuyuki, Santillan, Julius, Itani, Toshiro

Year:

2010

Language:

english

File:

PDF, 5.13 MB

english, 2010

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Evaluation of rinse material and process for EUV lithography

Wood, Obert R., Panning, Eric M., Yamamoto, Kazuma, Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 665 KB

english, 2015

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Relationship between stochastic effect and resist pattern defect in extreme ultraviolet lithography

Kozawa, Takahiro, Naulleau, Patrick P., Santillan, Julius J., Itani, Toshiro

Year:

2013

Language:

english

File:

PDF, 3.37 MB

english, 2013

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - EUV negative-resist based on thiol-yne system

Shirai, Masamitsu, Allen, Robert D., Somervell, Mark H., Maki, Koich, Okamura, Haruyuki, Kaneyama, Koji, Itani, Toshiro

Year:

2011

Language:

english

File:

PDF, 440 KB

english, 2011

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - An in situ analysis of resist dissolution in alkali-based and organic solvent-based developers using high speed atomic force microscopy

Wallow, Thomas I., Hohle, Christoph K., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Year:

2014

Language:

english

File:

PDF, 4.92 MB

english, 2014

45

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography

Watanabe, Kunio, Yamabe, Osamu, Kanda, Noriyoshi, Kim, J., Uchida, Noboru, Irie, Shigeo, Suganaga, Toshifumi, Itani, Toshiro, Kawahira, Hiroichi

Year:

2002

Language:

english

File:

PDF, 395 KB

english, 2002

46

Progress in 157-nm lithography development for 70-nm node

Toshiro Itani, Wataru Wakamiya

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.91 MB

english, 2002

47

Negative-type extreme ultraviolet Resist Materials based on Water-Wheel-like Cyclic Oligomer (Noria)

Seki, Hiroyuki, Kato, Yuki, Kudo, Hiroto, Oizumi, Hiroaki, Itani, Toshiro, Nishikubo, Tadatomi

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 277 KB

english, 2010

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Inhomogeneity of PAGs in a hybrid-type EUV resist system studied by molecular-dynamics simulations for EUV lithography

Wallow, Thomas I., Hohle, Christoph K., Toriumi, Minoru, Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 1.06 MB

english, 2015

49

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Ishikawa, Takuji, Koh, Meiten, Araki, Takayuki, Toriumi, Minoru, Kodani, T., Aoyama, Hirokazu, Yamashita, Tsuneo, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 413 KB

english, 2003

50

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Analysis of 193nm immersion specific defects

Otoguro, Akihiko, Lin, Qinghuang, Lee, Jeung-Woo, Itani, Toshiro, Fujii, Kiyoshi, Funakoshi, Tomohiro, Sakai, Tsunehiro, Watanabe, Kenji, Arakawa, Mikio, Nakano, Hitoshi, Kobayashi, Masamichi

Year:

2006

Language:

english

File:

PDF, 380 KB

english, 2006

To build up a library is to create a life. It’s never just a random collection of books.

— Carlos María Domínguez

Official channel

Z-Library Desktop Launcher

Z-Library Since 2009 support@1delivery.pm

EnglishРусскийEspañolItalianoελληνικάاللغة العربيةBahasa IndonesiaBahasa Malaysiaहिन्दीDeutschFrançaisPortuguêsУкраїнськаPolski中文繁體中文日本語Tiếng ViệtAzərbaycan DiliՀայոց լեզուภาษาไทยTürk Diliქართველიবাংলাپښتوతెలుగుاردو한국어SrpskiБългарски